ArF & KrF Dry Imaging

  • Leading edge lithography
  • Robust process latitude
  • Low defectivity
  • Excellent quality control
  • Low LWR
  • Low MEEF
  • Enhanced resolution to extend CoO of existing tool sets

ArF dry lithography - L/S

LWR improvement

ARX series - 60nm L/S - ASML /1400 (0.93NA)

High-Speed ArF Photoresist

Advanced KrF Solutions - M series

250nm CD, 630nm FT

EL, 250nm CD, 770nm FT