- Leading edge lithography
- Robust process latitude
- Low defectivity
- Excellent quality control
- Low LWR
- Low MEEF
- Enhanced resolution to extend CoO of existing tool sets
ArF dry lithography - L/S
LWR improvement
ARX series - 60nm L/S - ASML /1400 (0.93NA)
High-Speed ArF Photoresist
Advanced KrF Solutions - M series
250nm CD, 630nm FT
EL, 250nm CD, 770nm FT
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