JSR Carbon Underlayer:
- High carbon content
- Low outgassing performance
- Low bake temperatures
- Excellent filling and planarization control
JSR ISX Si Hardmask:
- Excellent shelf-life
- Good reworkability
- Organic BARC-like properties
- Resis compatible, reflectivity control, etc.
- High Si content; FT = ~30nm
Multilayer results: 42nm 1:1