Spin-on Dual Hard Mask Material

JSR Carbon Underlayer:

  • High carbon content
  • Low outgassing performance
  • Low bake temperatures
  • Excellent filling and planarization control

JSR ISX Si Hardmask:

  • Excellent shelf-life
  • Good reworkability
  • Organic BARC-like properties
  • Resis compatible, reflectivity control, etc.
  • High Si content; FT = ~30nm

Multilayer results: 42nm 1:1